Process Line Implementation for Applied Surface Nanotechnologies (PLIANT)
In this proposed integrating project we will develop innovative in-line high throughput manufacturing technologies which are all based on atmospheric pressure (AP) vapour phase surface and on AP plasma processing technologies. Both approaches have significant potential for the precise synthesis of nano-structures with tailored properties and their effective simultaneous combination is particularly promising. We propose to merge the unique potential of atmospheric pressure atomic layer deposition (AP-ALD), with nucleation and growth chemical vapour deposition (AP-CVD) with atmospheric pressure-based plasma technologies e.g. for surface nanostructuring by growth control or chemical etching and sub-nanoscale nucleation (seed) layers.
The potential for cost advantages of such an approach, combined with the targeted innovation, make the technology capable of step changes in nanomanufacturing. Compatible with high volume and flexible multifunctionalization, a scale-up to pilot lines will be a major objective. Pilot lines will establish equipment platforms which will be targeted for identified, and substantial potential applications, in three strategically significant industrial areas: (i) energy storage by high capacity batteries and hybrid capacitors with enhanced energy density, (ii) solar energy production and, (iii) energy efficient (lightweight) airplanes.
A further aim is to develop process control concepts based on in-situ monitoring methods allowing direct correlation of synthesis parameters with nanomaterial structure and composition. Demonstration of the developed online monitoring tools in pilot lines is targeted.
The integrating project targets a strategic contribution to establishing a European high value added nanomanufacturing industry. New, cost efficient production methods will improve the quality of products in high market value segments in industries such as renewable energy production, energy storage, aeronautics, and space.